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LIA names 2016 Schawlow Award winner

Laser Institute of America (LIA), Orlando, Fla., has announced that LIA Fellow, 2014

LIA President, and 2016 ICALEO® Nanomanufacturing Conference Chair Dr. Yongfeng Lu has been selected as the 2016 Arthur L. Schawlow Award recipient in recognition of his longstanding record of laser industry innovation and his significant contributions to basic and applied research in the fields of laser science and electrical engineering.

With more than 20 years of experience in the processing and characterization of microstructured and nanostructured materials and more than 300 journal papers and 350 conference papers published, Yu is a Lott Distinguished Professor of Engineering at the University of Nebraska-Lincoln (UNL). He has a bachelor’s degree from Tsinghua University in China and MSc and PhD degrees from Osaka University in Japan, all in electrical engineering.

Lu established UNL’s Laser Assisted Nano Engineering group in 2002 and has led several research projects for the university.